Atomic-layer-deposited aluminum oxide for the surface passivation of high-efficiency silicon solar cells

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Autorschaft

  • Jan Schmidt
  • Agnes Merkle
  • B. Hoex
  • M. C.M. Van De Sanden
  • W. M.M. Kessels
  • Rolf Brendel

Externe Organisationen

  • Institut für Solarenergieforschung GmbH (ISFH)
  • Eindhoven University of Technology (TU/e)
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Titel des Sammelwerks33rd IEEE Photovoltaic Specialists Conference, PVSC 2008
ISBN (elektronisch)9781424416417
PublikationsstatusVeröffentlicht - 2008
Extern publiziertJa
Veranstaltung33rd IEEE Photovoltaic Specialists Conference, PVSC 2008 - San Diego, CA, USA / Vereinigte Staaten
Dauer: 11 Mai 200816 Mai 2008

Publikationsreihe

NameConference Record of the IEEE Photovoltaic Specialists Conference
ISSN (Print)0160-8371

Abstract

We present independently confirmed efficiencies above 20% for PERC-type solar cells with the point-contacted rear being either passivated by atomic-layer-deposited Al2O3 or by stacks consisting of an ultrathin Al2O3 film and a thicker PECVD-SiOx layer. Internal quantum efficiency measurements reveal that the effective rear surface recombination velocities of the single-layer Al2O 3-passivated cells are comparable to those measured on reference cells passivated by an aluminum-annealed thermal SiO2, while those of the Al2O3/SiOx-passivated cells are even lower. Very low effective rear surface recombination velocities of only 70 cm/s are reported for the Al2O3/SiOx stacks, including metalized areas on the cell rear.

ASJC Scopus Sachgebiete

Zitieren

Atomic-layer-deposited aluminum oxide for the surface passivation of high-efficiency silicon solar cells. / Schmidt, Jan; Merkle, Agnes; Hoex, B. et al.
33rd IEEE Photovoltaic Specialists Conference, PVSC 2008. 2008. 4922636 (Conference Record of the IEEE Photovoltaic Specialists Conference).

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Schmidt, J, Merkle, A, Hoex, B, Van De Sanden, MCM, Kessels, WMM & Brendel, R 2008, Atomic-layer-deposited aluminum oxide for the surface passivation of high-efficiency silicon solar cells. in 33rd IEEE Photovoltaic Specialists Conference, PVSC 2008., 4922636, Conference Record of the IEEE Photovoltaic Specialists Conference, 33rd IEEE Photovoltaic Specialists Conference, PVSC 2008, San Diego, CA, USA / Vereinigte Staaten, 11 Mai 2008. https://doi.org/10.1109/PVSC.2008.4922636
Schmidt, J., Merkle, A., Hoex, B., Van De Sanden, M. C. M., Kessels, W. M. M., & Brendel, R. (2008). Atomic-layer-deposited aluminum oxide for the surface passivation of high-efficiency silicon solar cells. In 33rd IEEE Photovoltaic Specialists Conference, PVSC 2008 Artikel 4922636 (Conference Record of the IEEE Photovoltaic Specialists Conference). https://doi.org/10.1109/PVSC.2008.4922636
Schmidt J, Merkle A, Hoex B, Van De Sanden MCM, Kessels WMM, Brendel R. Atomic-layer-deposited aluminum oxide for the surface passivation of high-efficiency silicon solar cells. in 33rd IEEE Photovoltaic Specialists Conference, PVSC 2008. 2008. 4922636. (Conference Record of the IEEE Photovoltaic Specialists Conference). doi: 10.1109/PVSC.2008.4922636
Schmidt, Jan ; Merkle, Agnes ; Hoex, B. et al. / Atomic-layer-deposited aluminum oxide for the surface passivation of high-efficiency silicon solar cells. 33rd IEEE Photovoltaic Specialists Conference, PVSC 2008. 2008. (Conference Record of the IEEE Photovoltaic Specialists Conference).
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title = "Atomic-layer-deposited aluminum oxide for the surface passivation of high-efficiency silicon solar cells",
abstract = "We present independently confirmed efficiencies above 20% for PERC-type solar cells with the point-contacted rear being either passivated by atomic-layer-deposited Al2O3 or by stacks consisting of an ultrathin Al2O3 film and a thicker PECVD-SiOx layer. Internal quantum efficiency measurements reveal that the effective rear surface recombination velocities of the single-layer Al2O 3-passivated cells are comparable to those measured on reference cells passivated by an aluminum-annealed thermal SiO2, while those of the Al2O3/SiOx-passivated cells are even lower. Very low effective rear surface recombination velocities of only 70 cm/s are reported for the Al2O3/SiOx stacks, including metalized areas on the cell rear.",
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AU - Schmidt, Jan

AU - Merkle, Agnes

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AU - Van De Sanden, M. C.M.

AU - Kessels, W. M.M.

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AB - We present independently confirmed efficiencies above 20% for PERC-type solar cells with the point-contacted rear being either passivated by atomic-layer-deposited Al2O3 or by stacks consisting of an ultrathin Al2O3 film and a thicker PECVD-SiOx layer. Internal quantum efficiency measurements reveal that the effective rear surface recombination velocities of the single-layer Al2O 3-passivated cells are comparable to those measured on reference cells passivated by an aluminum-annealed thermal SiO2, while those of the Al2O3/SiOx-passivated cells are even lower. Very low effective rear surface recombination velocities of only 70 cm/s are reported for the Al2O3/SiOx stacks, including metalized areas on the cell rear.

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