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Atom lithography with cold metastable Ne* atoms

Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review

Autorschaft

  • P. Engels
  • W. Ertmer
  • K. Sengstock

Organisationseinheiten

Details

OriginalspracheEnglisch
Titel des SammelwerksQuantum Electronics and Laser Science Conference (QELS 2000)
Herausgeber (Verlag)IEEE Computer Society
Seitenumfang1
ISBN (Print)1-55752-608-7
PublikationsstatusVeröffentlicht - 6 Aug. 2000
VeranstaltungQuantum Electronics and Laser Science Conference (QELS 2000) - San Francisco, CA, USA
Dauer: 7 Mai 2000 → 12 Mai 2000

Publikationsreihe

NameOSA trends in optics and photonics : TOPS
Band40
ISSN (Print)1094-5695

Abstract

Experimental results as well as numerical simulation of atom lithography with a laser cooled metastable Ne* beam are discussed. Simulation results clearly show the feasibility for sub-10 nm structures by atom lithography.

ASJC Scopus Sachgebiete

Zitieren

Atom lithography with cold metastable Ne* atoms. / Engels, P.; Ertmer, W.; Sengstock, K.
Quantum Electronics and Laser Science Conference (QELS 2000). IEEE Computer Society, 2000. (OSA trends in optics and photonics : TOPS; Band 40).

Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review

Engels, P, Ertmer, W & Sengstock, K 2000, Atom lithography with cold metastable Ne* atoms. in Quantum Electronics and Laser Science Conference (QELS 2000). OSA trends in optics and photonics : TOPS, Bd. 40, IEEE Computer Society, Quantum Electronics and Laser Science Conference (QELS 2000), San Francisco, CA, USA, 7 Mai 2000.
Engels, P., Ertmer, W., & Sengstock, K. (2000). Atom lithography with cold metastable Ne* atoms. In Quantum Electronics and Laser Science Conference (QELS 2000) (OSA trends in optics and photonics : TOPS; Band 40). IEEE Computer Society.
Engels P, Ertmer W, Sengstock K. Atom lithography with cold metastable Ne* atoms. in Quantum Electronics and Laser Science Conference (QELS 2000). IEEE Computer Society. 2000. (OSA trends in optics and photonics : TOPS).
Engels, P. ; Ertmer, W. ; Sengstock, K. / Atom lithography with cold metastable Ne* atoms. Quantum Electronics and Laser Science Conference (QELS 2000). IEEE Computer Society, 2000. (OSA trends in optics and photonics : TOPS).
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Download

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