Analysis of the defect activation in CZ-silicon by temperature-dependent bias-induced degradation of solar cells

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Autoren

Externe Organisationen

  • Fraunhofer-Institut für Solare Energiesysteme (ISE)
  • Institut für Solarenergieforschung GmbH (ISFH)
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Details

OriginalspracheEnglisch
Titel des SammelwerksProceddings of the 3rd World Conference on Photovoltaic Energy Conversion
Herausgeber/-innenK. Kurokawa, L.L. Kazmerski, B. McNeils, M. Yamaguchi, C. Wronski
Seiten919-922
Seitenumfang4
PublikationsstatusVeröffentlicht - 2003
Extern publiziertJa
Veranstaltung3rd World Conference on Photovoltaic Energy Conversion - Osaka, Japan
Dauer: 11 Mai 200318 Mai 2003

Publikationsreihe

NameProceedings of the 3rd World Conference on Photovoltaic Energy Conversion
BandA

Abstract

The activation of the metastable defect in boron-doped Cz-Si is analyzed by application of small forward voltages to Cz-Si cells in the dark. In contrast to the carrier injection by light used in previous experiments, this method allows to observe the defect activation at very low excess carrier densities. Thus, the minimum level of excess carriers necessary to activate the metastable defect could be determined for the first time. This threshold value was measured for materials with different boron concentrations at different temperatures. Our analysis allows to decide that the defect activation is not due to a shift of the Fermi-level across a certain defect energy level, changing its charge state, but due to a recombination-enhanced activation of the defect.

ASJC Scopus Sachgebiete

Zitieren

Analysis of the defect activation in CZ-silicon by temperature-dependent bias-induced degradation of solar cells. / Glunz, S. W.; Schäffer, E.; Rein, S. et al.
Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion. Hrsg. / K. Kurokawa; L.L. Kazmerski; B. McNeils; M. Yamaguchi; C. Wronski. 2003. S. 919-922 (Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion; Band A).

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Glunz, SW, Schäffer, E, Rein, S, Bothe, K & Schmidt, J 2003, Analysis of the defect activation in CZ-silicon by temperature-dependent bias-induced degradation of solar cells. in K Kurokawa, LL Kazmerski, B McNeils, M Yamaguchi & C Wronski (Hrsg.), Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion. Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion, Bd. A, S. 919-922, 3rd World Conference on Photovoltaic Energy Conversion, Osaka, Japan, 11 Mai 2003.
Glunz, S. W., Schäffer, E., Rein, S., Bothe, K., & Schmidt, J. (2003). Analysis of the defect activation in CZ-silicon by temperature-dependent bias-induced degradation of solar cells. In K. Kurokawa, L. L. Kazmerski, B. McNeils, M. Yamaguchi, & C. Wronski (Hrsg.), Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion (S. 919-922). (Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion; Band A).
Glunz SW, Schäffer E, Rein S, Bothe K, Schmidt J. Analysis of the defect activation in CZ-silicon by temperature-dependent bias-induced degradation of solar cells. in Kurokawa K, Kazmerski LL, McNeils B, Yamaguchi M, Wronski C, Hrsg., Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion. 2003. S. 919-922. (Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion).
Glunz, S. W. ; Schäffer, E. ; Rein, S. et al. / Analysis of the defect activation in CZ-silicon by temperature-dependent bias-induced degradation of solar cells. Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion. Hrsg. / K. Kurokawa ; L.L. Kazmerski ; B. McNeils ; M. Yamaguchi ; C. Wronski. 2003. S. 919-922 (Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion).
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title = "Analysis of the defect activation in CZ-silicon by temperature-dependent bias-induced degradation of solar cells",
abstract = "The activation of the metastable defect in boron-doped Cz-Si is analyzed by application of small forward voltages to Cz-Si cells in the dark. In contrast to the carrier injection by light used in previous experiments, this method allows to observe the defect activation at very low excess carrier densities. Thus, the minimum level of excess carriers necessary to activate the metastable defect could be determined for the first time. This threshold value was measured for materials with different boron concentrations at different temperatures. Our analysis allows to decide that the defect activation is not due to a shift of the Fermi-level across a certain defect energy level, changing its charge state, but due to a recombination-enhanced activation of the defect.",
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Download

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T1 - Analysis of the defect activation in CZ-silicon by temperature-dependent bias-induced degradation of solar cells

AU - Glunz, S. W.

AU - Schäffer, E.

AU - Rein, S.

AU - Bothe, K.

AU - Schmidt, J.

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N2 - The activation of the metastable defect in boron-doped Cz-Si is analyzed by application of small forward voltages to Cz-Si cells in the dark. In contrast to the carrier injection by light used in previous experiments, this method allows to observe the defect activation at very low excess carrier densities. Thus, the minimum level of excess carriers necessary to activate the metastable defect could be determined for the first time. This threshold value was measured for materials with different boron concentrations at different temperatures. Our analysis allows to decide that the defect activation is not due to a shift of the Fermi-level across a certain defect energy level, changing its charge state, but due to a recombination-enhanced activation of the defect.

AB - The activation of the metastable defect in boron-doped Cz-Si is analyzed by application of small forward voltages to Cz-Si cells in the dark. In contrast to the carrier injection by light used in previous experiments, this method allows to observe the defect activation at very low excess carrier densities. Thus, the minimum level of excess carriers necessary to activate the metastable defect could be determined for the first time. This threshold value was measured for materials with different boron concentrations at different temperatures. Our analysis allows to decide that the defect activation is not due to a shift of the Fermi-level across a certain defect energy level, changing its charge state, but due to a recombination-enhanced activation of the defect.

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M3 - Conference contribution

AN - SCOPUS:6344240819

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T3 - Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion

SP - 919

EP - 922

BT - Proceddings of the 3rd World Conference on Photovoltaic Energy Conversion

A2 - Kurokawa, K.

A2 - Kazmerski, L.L.

A2 - McNeils, B.

A2 - Yamaguchi, M.

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T2 - 3rd World Conference on Photovoltaic Energy Conversion

Y2 - 11 May 2003 through 18 May 2003

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