Analysis of local Al-doped back surface fields for high efficiency screen-printed solar cells

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Autoren

  • S. Gatz
  • K. Bothe
  • J. Müller
  • T. Dullweber
  • R. Brendel

Organisationseinheiten

Externe Organisationen

  • Institut für Solarenergieforschung GmbH (ISFH)
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Details

OriginalspracheEnglisch
Seiten (von - bis)318-323
Seitenumfang6
FachzeitschriftEnergy Procedia
Jahrgang8
Frühes Online-Datum12 Aug. 2011
PublikationsstatusVeröffentlicht - 2011

Abstract

In this paper, we investigate the surface recombination of local screen-printed aluminum contacts applied to rear passivated solar cells. We measure the surface recombination velocity by microwave-detected photoconductance decay measurements on test wafers with various contact geometries and compare two different aluminum pastes. The aluminum paste which is optimized for local contacts shows a deep and uniform local back surface field that results in Smet = 600 cm/s on 1.5 Ωcm p-type silicon. In contrast, a standard Al paste for full-area metallization shows a nonuniform back surface field and a Smet of 2000 cm/s on the same material. We achieve an area-averaged rear surface recombination velocity S rear = (65 ± 20) cm/s for line contacts with a pitch of 2 mm. The application of the optimized paste to screen-printed solar cells with dielectric surface passivation results in efficiencies of up to 19.2 % with a Voc = 655 mV and a Jsc = 38.4 mA/cm2 on 125×125 mm2 p-type Cz silicon wafers. The internal quantum efficiency analysis reveals Srear = (70 ± 30) cm/s which is in agreement with our lifetime results. Applying fine line screenprinting, efficiencies up to 19.4 % are demonstrated.

ASJC Scopus Sachgebiete

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Analysis of local Al-doped back surface fields for high efficiency screen-printed solar cells. / Gatz, S.; Bothe, K.; Müller, J. et al.
in: Energy Procedia, Jahrgang 8, 2011, S. 318-323.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Gatz S, Bothe K, Müller J, Dullweber T, Brendel R. Analysis of local Al-doped back surface fields for high efficiency screen-printed solar cells. Energy Procedia. 2011;8:318-323. Epub 2011 Aug 12. doi: 10.1016/j.egypro.2011.06.143, 10.15488/1149
Gatz, S. ; Bothe, K. ; Müller, J. et al. / Analysis of local Al-doped back surface fields for high efficiency screen-printed solar cells. in: Energy Procedia. 2011 ; Jahrgang 8. S. 318-323.
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AU - Gatz, S.

AU - Bothe, K.

AU - Müller, J.

AU - Dullweber, T.

AU - Brendel, R.

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N2 - In this paper, we investigate the surface recombination of local screen-printed aluminum contacts applied to rear passivated solar cells. We measure the surface recombination velocity by microwave-detected photoconductance decay measurements on test wafers with various contact geometries and compare two different aluminum pastes. The aluminum paste which is optimized for local contacts shows a deep and uniform local back surface field that results in Smet = 600 cm/s on 1.5 Ωcm p-type silicon. In contrast, a standard Al paste for full-area metallization shows a nonuniform back surface field and a Smet of 2000 cm/s on the same material. We achieve an area-averaged rear surface recombination velocity S rear = (65 ± 20) cm/s for line contacts with a pitch of 2 mm. The application of the optimized paste to screen-printed solar cells with dielectric surface passivation results in efficiencies of up to 19.2 % with a Voc = 655 mV and a Jsc = 38.4 mA/cm2 on 125×125 mm2 p-type Cz silicon wafers. The internal quantum efficiency analysis reveals Srear = (70 ± 30) cm/s which is in agreement with our lifetime results. Applying fine line screenprinting, efficiencies up to 19.4 % are demonstrated.

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