An exhaustive study of laser damage in ion beam sputtered pure and mixture oxide thin films at 1030 nm with 500 fs pulse durations

Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review

Autoren

  • Laurent Gallais
  • Benoit Mangote
  • Mireille Commandré
  • Mathias Mende
  • Lars Jensen
  • Henrik Ehlers
  • Marco Jupé
  • Detlev Ristau
  • Andrius Melninkaitis
  • Valdas Sirutkaitis
  • Simonas Kičas
  • Tomas Tolenis
  • Ramutis Drazdys

Organisationseinheiten

Externe Organisationen

  • Ecole Centrale Marseille
  • Laser Zentrum Hannover e.V. (LZH)
  • Vilnius University
  • Center for Physical Sciences and Technology (FTMC)
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Titel des Sammelwerks44th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials
Untertitel2012
Herausgeber (Verlag)SPIE
ISBN (Print)9780819492708
PublikationsstatusVeröffentlicht - 29 Nov. 2012
Veranstaltung44th Annual Laser Damage Symposium: Laser-Induced Damage in Optical Materials: 2012 - Boulder, CO, USA / Vereinigte Staaten
Dauer: 23 Sept. 2012 → 26 Sept. 2012

Publikationsreihe

NameProceedings of SPIE - The International Society for Optical Engineering
Band8530
ISSN (Print)0277-786X
ISSN (elektronisch)1996-756X

Abstract

We report on the laser damage resistance of thin films prepared by Ion Beam Sputtering. The samples are fused silica substrates coated with single layer films of pure oxides (SiO2, Nb2O5, ZrO 2, HfO2, Ta2O5, Al2O 3, Sc2O3) and oxide mixtures with various ratios (Nb2O5/SiO2, ZrO2/SiO 2, HfO2/SiO2Ta2O5/ SiO2, Al2O3/SiO2 and Sc 2O3/SiO2). For this study the LIDT of more than 60 different samples have measured at 1030nm with pulse durations of 500fs with single pulse irradiation. The results are expressed and compared in terms of LIDT as a function of the measured band gap energy and refractive index. For simple oxide materials a linear evolution of the LIDT with bandgap is observed, with the exception of Sc2O3material where a very high damage threshold is observed, compared to other high index materials. In the case of mixtures, a more complex behavior is evidenced.

ASJC Scopus Sachgebiete

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An exhaustive study of laser damage in ion beam sputtered pure and mixture oxide thin films at 1030 nm with 500 fs pulse durations. / Gallais, Laurent; Mangote, Benoit; Commandré, Mireille et al.
44th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2012. SPIE, 2012. 85300K (Proceedings of SPIE - The International Society for Optical Engineering; Band 8530).

Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review

Gallais, L, Mangote, B, Commandré, M, Mende, M, Jensen, L, Ehlers, H, Jupé, M, Ristau, D, Melninkaitis, A, Sirutkaitis, V, Kičas, S, Tolenis, T & Drazdys, R 2012, An exhaustive study of laser damage in ion beam sputtered pure and mixture oxide thin films at 1030 nm with 500 fs pulse durations. in 44th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2012., 85300K, Proceedings of SPIE - The International Society for Optical Engineering, Bd. 8530, SPIE, 44th Annual Laser Damage Symposium, Boulder, CO, USA / Vereinigte Staaten, 23 Sept. 2012. https://doi.org/10.1117/12.977553
Gallais, L., Mangote, B., Commandré, M., Mende, M., Jensen, L., Ehlers, H., Jupé, M., Ristau, D., Melninkaitis, A., Sirutkaitis, V., Kičas, S., Tolenis, T., & Drazdys, R. (2012). An exhaustive study of laser damage in ion beam sputtered pure and mixture oxide thin films at 1030 nm with 500 fs pulse durations. In 44th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2012 Artikel 85300K (Proceedings of SPIE - The International Society for Optical Engineering; Band 8530). SPIE. https://doi.org/10.1117/12.977553
Gallais L, Mangote B, Commandré M, Mende M, Jensen L, Ehlers H et al. An exhaustive study of laser damage in ion beam sputtered pure and mixture oxide thin films at 1030 nm with 500 fs pulse durations. in 44th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2012. SPIE. 2012. 85300K. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.977553
Gallais, Laurent ; Mangote, Benoit ; Commandré, Mireille et al. / An exhaustive study of laser damage in ion beam sputtered pure and mixture oxide thin films at 1030 nm with 500 fs pulse durations. 44th Annual Laser Damage Symposium Proceedings - Laser-Induced Damage in Optical Materials: 2012. SPIE, 2012. (Proceedings of SPIE - The International Society for Optical Engineering).
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abstract = "We report on the laser damage resistance of thin films prepared by Ion Beam Sputtering. The samples are fused silica substrates coated with single layer films of pure oxides (SiO2, Nb2O5, ZrO 2, HfO2, Ta2O5, Al2O 3, Sc2O3) and oxide mixtures with various ratios (Nb2O5/SiO2, ZrO2/SiO 2, HfO2/SiO2Ta2O5/ SiO2, Al2O3/SiO2 and Sc 2O3/SiO2). For this study the LIDT of more than 60 different samples have measured at 1030nm with pulse durations of 500fs with single pulse irradiation. The results are expressed and compared in terms of LIDT as a function of the measured band gap energy and refractive index. For simple oxide materials a linear evolution of the LIDT with bandgap is observed, with the exception of Sc2O3material where a very high damage threshold is observed, compared to other high index materials. In the case of mixtures, a more complex behavior is evidenced.",
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T1 - An exhaustive study of laser damage in ion beam sputtered pure and mixture oxide thin films at 1030 nm with 500 fs pulse durations

AU - Gallais, Laurent

AU - Mangote, Benoit

AU - Commandré, Mireille

AU - Mende, Mathias

AU - Jensen, Lars

AU - Ehlers, Henrik

AU - Jupé, Marco

AU - Ristau, Detlev

AU - Melninkaitis, Andrius

AU - Sirutkaitis, Valdas

AU - Kičas, Simonas

AU - Tolenis, Tomas

AU - Drazdys, Ramutis

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Y1 - 2012/11/29

N2 - We report on the laser damage resistance of thin films prepared by Ion Beam Sputtering. The samples are fused silica substrates coated with single layer films of pure oxides (SiO2, Nb2O5, ZrO 2, HfO2, Ta2O5, Al2O 3, Sc2O3) and oxide mixtures with various ratios (Nb2O5/SiO2, ZrO2/SiO 2, HfO2/SiO2Ta2O5/ SiO2, Al2O3/SiO2 and Sc 2O3/SiO2). For this study the LIDT of more than 60 different samples have measured at 1030nm with pulse durations of 500fs with single pulse irradiation. The results are expressed and compared in terms of LIDT as a function of the measured band gap energy and refractive index. For simple oxide materials a linear evolution of the LIDT with bandgap is observed, with the exception of Sc2O3material where a very high damage threshold is observed, compared to other high index materials. In the case of mixtures, a more complex behavior is evidenced.

AB - We report on the laser damage resistance of thin films prepared by Ion Beam Sputtering. The samples are fused silica substrates coated with single layer films of pure oxides (SiO2, Nb2O5, ZrO 2, HfO2, Ta2O5, Al2O 3, Sc2O3) and oxide mixtures with various ratios (Nb2O5/SiO2, ZrO2/SiO 2, HfO2/SiO2Ta2O5/ SiO2, Al2O3/SiO2 and Sc 2O3/SiO2). For this study the LIDT of more than 60 different samples have measured at 1030nm with pulse durations of 500fs with single pulse irradiation. The results are expressed and compared in terms of LIDT as a function of the measured band gap energy and refractive index. For simple oxide materials a linear evolution of the LIDT with bandgap is observed, with the exception of Sc2O3material where a very high damage threshold is observed, compared to other high index materials. In the case of mixtures, a more complex behavior is evidenced.

KW - Femtosecond

KW - Laser-induced damage

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KW - Oxide mixtures

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