Advances in contactless silicon defect and impurity diagnostics based on lifetime spectroscopy and infrared imaging

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  • Institut für Solarenergieforschung GmbH (ISFH)
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OriginalspracheEnglisch
Aufsatznummer92842
FachzeitschriftAdvances in OptoElectronics
Jahrgang2007
Frühes Online-Datum31 Mai 2007
PublikationsstatusVeröffentlicht - 2007
Extern publiziertJa

Abstract

This paper gives a review of some recent developments in the field of contactless silicon wafer characterization techniques based on lifetime spectroscopy and infrared imaging. In the first part of the contribution, we outline the status of different lifetime spectroscopy approaches suitable for the identification of impurities in silicon and discussin more detailthe technique of temperature- and injection-dependent lifetime spectroscopy. The second part of the paper focuses on the application of infrared cameras to analyze spatial inhomogeneities in silicon wafers. By measuring the infrared signal absorbed or emitted from light-generated free excess carriers, high-resolution recombination lifetime mappings can be generated within seconds to minutes. In addition, mappings of non-recombination-active trapping centers can be deduced from injection-dependent infrared lifetime images. The trap density has been demonstrated to be an important additional parameter in the characterization and assessment of solar-grade multicrystalline silicon wafers, as areas of increased trap density tend to deteriorate during solar cell processing.

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Advances in contactless silicon defect and impurity diagnostics based on lifetime spectroscopy and infrared imaging. / Schmidt, Jan; Pohl, Peter; Bothe, Karsten et al.
in: Advances in OptoElectronics, Jahrgang 2007, 92842, 2007.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Schmidt J, Pohl P, Bothe K, Brendel R. Advances in contactless silicon defect and impurity diagnostics based on lifetime spectroscopy and infrared imaging. Advances in OptoElectronics. 2007;2007:92842. Epub 2007 Mai 31. doi: 10.1155/2007/92842
Schmidt, Jan ; Pohl, Peter ; Bothe, Karsten et al. / Advances in contactless silicon defect and impurity diagnostics based on lifetime spectroscopy and infrared imaging. in: Advances in OptoElectronics. 2007 ; Jahrgang 2007.
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abstract = "This paper gives a review of some recent developments in the field of contactless silicon wafer characterization techniques based on lifetime spectroscopy and infrared imaging. In the first part of the contribution, we outline the status of different lifetime spectroscopy approaches suitable for the identification of impurities in silicon and discussin more detailthe technique of temperature- and injection-dependent lifetime spectroscopy. The second part of the paper focuses on the application of infrared cameras to analyze spatial inhomogeneities in silicon wafers. By measuring the infrared signal absorbed or emitted from light-generated free excess carriers, high-resolution recombination lifetime mappings can be generated within seconds to minutes. In addition, mappings of non-recombination-active trapping centers can be deduced from injection-dependent infrared lifetime images. The trap density has been demonstrated to be an important additional parameter in the characterization and assessment of solar-grade multicrystalline silicon wafers, as areas of increased trap density tend to deteriorate during solar cell processing.",
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AU - Pohl, Peter

AU - Bothe, Karsten

AU - Brendel, Rolf

N1 - Funding Information: The authors are grateful to T. Abe (ShinEtsu) for supplying tungsten-contaminated silicon wafers. Funding was provided by the German State of Lower Saxony.

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