Details
| Originalsprache | Englisch |
|---|---|
| Seiten (von - bis) | 8203-8210 |
| Seitenumfang | 8 |
| Fachzeitschrift | Applied Optics |
| Jahrgang | 51 |
| Ausgabenummer | 34 |
| Publikationsstatus | Veröffentlicht - 1 Dez. 2012 |
Abstract
If a new complex optical multilayer system, coating chamber, material, or design has to be evaluated, there is often a need for several test deposition runs until most significant errors and coating properties are identified. We present an advanced procedure with combination of an optical broadband thickness monitor, computational manufacturing, and automated reoptimization, which requires only one single test deposition run. For the identification of material and deposition errors, the single test deposition run is evaluated by the computational manufacturing using different parameter sets. Determined main errors are corrected (e.g., dispersion), and remaining smaller errors will be compensated with the automated reoptimization tool as an expansion of the optical monitor.
ASJC Scopus Sachgebiete
- Physik und Astronomie (insg.)
- Atom- und Molekularphysik sowie Optik
- Ingenieurwesen (insg.)
- Ingenieurwesen (sonstige)
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
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in: Applied Optics, Jahrgang 51, Nr. 34, 01.12.2012, S. 8203-8210.
Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review
}
TY - JOUR
T1 - Advanced error identification in deposition of complex optical layer systems by a multianalyzing approach
AU - Schmitz, Carsten
AU - Ehlers, Henrik
AU - Ristau, Detlev
PY - 2012/12/1
Y1 - 2012/12/1
N2 - If a new complex optical multilayer system, coating chamber, material, or design has to be evaluated, there is often a need for several test deposition runs until most significant errors and coating properties are identified. We present an advanced procedure with combination of an optical broadband thickness monitor, computational manufacturing, and automated reoptimization, which requires only one single test deposition run. For the identification of material and deposition errors, the single test deposition run is evaluated by the computational manufacturing using different parameter sets. Determined main errors are corrected (e.g., dispersion), and remaining smaller errors will be compensated with the automated reoptimization tool as an expansion of the optical monitor.
AB - If a new complex optical multilayer system, coating chamber, material, or design has to be evaluated, there is often a need for several test deposition runs until most significant errors and coating properties are identified. We present an advanced procedure with combination of an optical broadband thickness monitor, computational manufacturing, and automated reoptimization, which requires only one single test deposition run. For the identification of material and deposition errors, the single test deposition run is evaluated by the computational manufacturing using different parameter sets. Determined main errors are corrected (e.g., dispersion), and remaining smaller errors will be compensated with the automated reoptimization tool as an expansion of the optical monitor.
UR - http://www.scopus.com/inward/record.url?scp=84870859406&partnerID=8YFLogxK
U2 - 10.1364/AO.51.008203
DO - 10.1364/AO.51.008203
M3 - Article
AN - SCOPUS:84870859406
VL - 51
SP - 8203
EP - 8210
JO - Applied Optics
JF - Applied Optics
SN - 0003-6935
IS - 34
ER -