Details
Originalsprache | Englisch |
---|---|
Aufsatznummer | S10203 |
Fachzeitschrift | Chinese Optics Letters |
Jahrgang | 11 |
Ausgabenummer | SUPPL.1 |
Publikationsstatus | Veröffentlicht - Juni 2013 |
Abstract
During the last decade, striking improvements could be achieved for the precise control of deposition processes in optical coating technology. For example, as a consequence of enormous progresses in measurement and computer technology, direct optical monitoring in a broad spectral range can be considered as a common tool in many production environments nowadays. Besides the development of the corresponding hardware and measurement channels, advanced approaches for the evaluation of the acquired data and new multiple sensor monitoring strategies moved into the focus of modern research on the way towards deterministic deposition techniques. In this context, also innovative concepts for the simulation of deposition processes to forecast the result for a specified coating design and automatic online correction algorithms gained of importance to reduce the risk of failure in coating production. The present contribution will be dedicated to selected aspects in this field, especially addressing broad band optical monitoring systems. A short review on examples for existing hardware configurations and software tools will be presented illustrating the advantages of modern process control techniques. Novel approaches based on the modeling of thin film growth are discussed as an additional strategy to improve the predictability of coating processes.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Atom- und Molekularphysik sowie Optik
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
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in: Chinese Optics Letters, Jahrgang 11, Nr. SUPPL.1, S10203, 06.2013.
Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review
}
TY - JOUR
T1 - Advanced control and modeling of deposition processes
AU - Ristau, Detlev
AU - Ehlers, Henrik
PY - 2013/6
Y1 - 2013/6
N2 - During the last decade, striking improvements could be achieved for the precise control of deposition processes in optical coating technology. For example, as a consequence of enormous progresses in measurement and computer technology, direct optical monitoring in a broad spectral range can be considered as a common tool in many production environments nowadays. Besides the development of the corresponding hardware and measurement channels, advanced approaches for the evaluation of the acquired data and new multiple sensor monitoring strategies moved into the focus of modern research on the way towards deterministic deposition techniques. In this context, also innovative concepts for the simulation of deposition processes to forecast the result for a specified coating design and automatic online correction algorithms gained of importance to reduce the risk of failure in coating production. The present contribution will be dedicated to selected aspects in this field, especially addressing broad band optical monitoring systems. A short review on examples for existing hardware configurations and software tools will be presented illustrating the advantages of modern process control techniques. Novel approaches based on the modeling of thin film growth are discussed as an additional strategy to improve the predictability of coating processes.
AB - During the last decade, striking improvements could be achieved for the precise control of deposition processes in optical coating technology. For example, as a consequence of enormous progresses in measurement and computer technology, direct optical monitoring in a broad spectral range can be considered as a common tool in many production environments nowadays. Besides the development of the corresponding hardware and measurement channels, advanced approaches for the evaluation of the acquired data and new multiple sensor monitoring strategies moved into the focus of modern research on the way towards deterministic deposition techniques. In this context, also innovative concepts for the simulation of deposition processes to forecast the result for a specified coating design and automatic online correction algorithms gained of importance to reduce the risk of failure in coating production. The present contribution will be dedicated to selected aspects in this field, especially addressing broad band optical monitoring systems. A short review on examples for existing hardware configurations and software tools will be presented illustrating the advantages of modern process control techniques. Novel approaches based on the modeling of thin film growth are discussed as an additional strategy to improve the predictability of coating processes.
UR - http://www.scopus.com/inward/record.url?scp=84881591151&partnerID=8YFLogxK
U2 - 10.3788/COL201311.S10203
DO - 10.3788/COL201311.S10203
M3 - Article
AN - SCOPUS:84881591151
VL - 11
JO - Chinese Optics Letters
JF - Chinese Optics Letters
SN - 1671-7694
IS - SUPPL.1
M1 - S10203
ER -