Details
| Titel in Übersetzung | Imaging Mueller matrix ellipsometry for characterization of non-periodic nanostructures |
|---|---|
| Originalsprache | Deutsch |
| Seiten (von - bis) | 438-446 |
| Seitenumfang | 9 |
| Fachzeitschrift | Technisches Messen |
| Jahrgang | 89 |
| Ausgabenummer | 6 |
| Publikationsstatus | Veröffentlicht - 1 Juni 2022 |
| Extern publiziert | Ja |
Abstract
Especially Mueller matrix ellipsometry allows the measurement of optical or geometrical parameters with uncertainties down to the sub-nanometer range. In conventional ellipsometry, this involves averaging over the complete illumination spot size. If the structured area on the sample is smaller than the illumination spot, or the structure has no periodicity, the measurement result may contain reflected signals from the surrounding areas. This is particularly noticeable for free-standing nanostructures with diameters smaller than the illumination spot size. In such cases, imaging ellipsometry can be used. Here, a Mueller matrix is measured for each pixel in a camera image, allowing the polarization influence of the sample to be investigated locally. In this paper, we provide approaches to determine concrete relationships between geometric properties of nanostructures on off-diagonal elements of the Mueller matrix. To this end, we have implemented a setup for measuring Mueller matrix images at different angles of incidence in transmission and reflection, and fabricated a sample with which we systematically measure geometric structural properties in Mueller matrix images. We present measurements as well as numerical simulations to compare the results. Furthermore, we discuss thermal influences on measurement results and present an algorithm for their treatment.
Schlagwörter
- Abbildende Ellipsometrie, Ellipsometrie, Müller-Ellipsometrie, Nanometrologie, Nanostrukturen, ellipsometry, Nanometrology, Mueller ellipsometry, nanostructures, imaging ellipsometry
ASJC Scopus Sachgebiete
- Physik und Astronomie (insg.)
- Instrumentierung
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
Zitieren
- Standard
- Harvard
- Apa
- Vancouver
- BibTex
- RIS
in: Technisches Messen, Jahrgang 89, Nr. 6, 01.06.2022, S. 438-446.
Publikation: Beitrag in Fachzeitschrift › Artikel › Forschung › Peer-Review
}
TY - JOUR
T1 - Abbildende Müller-Matrix-Ellipsometrie für die Charakterisierung vereinzelter Nanostrukturen
AU - Käseberg, Tim
AU - Grundmann, Jana
AU - Siefke, Thomas
AU - Kroker, Stefanie
AU - Bodermann, Bernd
N1 - Publisher Copyright: © 2022 Käseberg et al.
PY - 2022/6/1
Y1 - 2022/6/1
N2 - Especially Mueller matrix ellipsometry allows the measurement of optical or geometrical parameters with uncertainties down to the sub-nanometer range. In conventional ellipsometry, this involves averaging over the complete illumination spot size. If the structured area on the sample is smaller than the illumination spot, or the structure has no periodicity, the measurement result may contain reflected signals from the surrounding areas. This is particularly noticeable for free-standing nanostructures with diameters smaller than the illumination spot size. In such cases, imaging ellipsometry can be used. Here, a Mueller matrix is measured for each pixel in a camera image, allowing the polarization influence of the sample to be investigated locally. In this paper, we provide approaches to determine concrete relationships between geometric properties of nanostructures on off-diagonal elements of the Mueller matrix. To this end, we have implemented a setup for measuring Mueller matrix images at different angles of incidence in transmission and reflection, and fabricated a sample with which we systematically measure geometric structural properties in Mueller matrix images. We present measurements as well as numerical simulations to compare the results. Furthermore, we discuss thermal influences on measurement results and present an algorithm for their treatment.
AB - Especially Mueller matrix ellipsometry allows the measurement of optical or geometrical parameters with uncertainties down to the sub-nanometer range. In conventional ellipsometry, this involves averaging over the complete illumination spot size. If the structured area on the sample is smaller than the illumination spot, or the structure has no periodicity, the measurement result may contain reflected signals from the surrounding areas. This is particularly noticeable for free-standing nanostructures with diameters smaller than the illumination spot size. In such cases, imaging ellipsometry can be used. Here, a Mueller matrix is measured for each pixel in a camera image, allowing the polarization influence of the sample to be investigated locally. In this paper, we provide approaches to determine concrete relationships between geometric properties of nanostructures on off-diagonal elements of the Mueller matrix. To this end, we have implemented a setup for measuring Mueller matrix images at different angles of incidence in transmission and reflection, and fabricated a sample with which we systematically measure geometric structural properties in Mueller matrix images. We present measurements as well as numerical simulations to compare the results. Furthermore, we discuss thermal influences on measurement results and present an algorithm for their treatment.
KW - Abbildende Ellipsometrie
KW - Ellipsometrie
KW - Müller-Ellipsometrie
KW - Nanometrologie
KW - Nanostrukturen
KW - ellipsometry
KW - Nanometrology
KW - Mueller ellipsometry
KW - nanostructures
KW - imaging ellipsometry
UR - http://www.scopus.com/inward/record.url?scp=85126063384&partnerID=8YFLogxK
U2 - 10.1515/teme-2021-0133
DO - 10.1515/teme-2021-0133
M3 - Artikel
AN - SCOPUS:85126063384
VL - 89
SP - 438
EP - 446
JO - Technisches Messen
JF - Technisches Messen
SN - 0171-8096
IS - 6
ER -