Details
| Originalsprache | Englisch |
|---|---|
| Titel des Sammelwerks | Advances in Optical Thin Films III |
| Publikationsstatus | Veröffentlicht - 25 Sept. 2008 |
| Extern publiziert | Ja |
| Veranstaltung | Advances in Optical Thin Films III - Glasgow, Großbritannien / Vereinigtes Königreich Dauer: 2 Sept. 2008 → 3 Sept. 2008 |
Publikationsreihe
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Band | 7101 |
| ISSN (Print) | 0277-786X |
Abstract
The substrate temperature is one of the key parameters, which determines the optical properties of deposited dielectric coatings. Depending on the employed material and application, the accurate knowledge of the substrate temperature is crucial for the system performance. Currently, the heating process inside the evacuated deposition plant is usually performed by radiation sources. The temperature of the substrates is governed be their emission and absorption characteristics and in minor degree, by heat conduction to the substrate holders. Pyrometric methods and temperature sensors are commonly used to measure the temperature close to the substrates. In any case, the measured temperature can deviate extremely from the real substrate temperature. In particular, if materials with a high transmittance in the IR range are used, the heating process can be controlled only with a large error by the conventional methods. In this contribution, an adapted method using optical characterisation of the substrate is presented to determine precisely the substrate temperature. In the described method, the optical transmittance of the components is measured and the absorption characteristic in the VUV and visible spectral range is used to evaluate the current substrate temperature.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Informatik (insg.)
- Angewandte Informatik
- Mathematik (insg.)
- Angewandte Mathematik
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
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- BibTex
- RIS
Advances in Optical Thin Films III. 2008. 71010F (Proceedings of SPIE - The International Society for Optical Engineering; Band 7101).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - A method for the determination of substrate temperature during thin film coating deposition
AU - Günster, Stefan
AU - Ehlers, Henrik
AU - Ristau, Detlev
PY - 2008/9/25
Y1 - 2008/9/25
N2 - The substrate temperature is one of the key parameters, which determines the optical properties of deposited dielectric coatings. Depending on the employed material and application, the accurate knowledge of the substrate temperature is crucial for the system performance. Currently, the heating process inside the evacuated deposition plant is usually performed by radiation sources. The temperature of the substrates is governed be their emission and absorption characteristics and in minor degree, by heat conduction to the substrate holders. Pyrometric methods and temperature sensors are commonly used to measure the temperature close to the substrates. In any case, the measured temperature can deviate extremely from the real substrate temperature. In particular, if materials with a high transmittance in the IR range are used, the heating process can be controlled only with a large error by the conventional methods. In this contribution, an adapted method using optical characterisation of the substrate is presented to determine precisely the substrate temperature. In the described method, the optical transmittance of the components is measured and the absorption characteristic in the VUV and visible spectral range is used to evaluate the current substrate temperature.
AB - The substrate temperature is one of the key parameters, which determines the optical properties of deposited dielectric coatings. Depending on the employed material and application, the accurate knowledge of the substrate temperature is crucial for the system performance. Currently, the heating process inside the evacuated deposition plant is usually performed by radiation sources. The temperature of the substrates is governed be their emission and absorption characteristics and in minor degree, by heat conduction to the substrate holders. Pyrometric methods and temperature sensors are commonly used to measure the temperature close to the substrates. In any case, the measured temperature can deviate extremely from the real substrate temperature. In particular, if materials with a high transmittance in the IR range are used, the heating process can be controlled only with a large error by the conventional methods. In this contribution, an adapted method using optical characterisation of the substrate is presented to determine precisely the substrate temperature. In the described method, the optical transmittance of the components is measured and the absorption characteristic in the VUV and visible spectral range is used to evaluate the current substrate temperature.
KW - Coating deposition
KW - Substrate temperature control
KW - VIS coatings
KW - VUV coatings
UR - http://www.scopus.com/inward/record.url?scp=56249120661&partnerID=8YFLogxK
U2 - 10.1117/12.797764
DO - 10.1117/12.797764
M3 - Conference contribution
AN - SCOPUS:56249120661
SN - 9780819473318
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Advances in Optical Thin Films III
T2 - Advances in Optical Thin Films III
Y2 - 2 September 2008 through 3 September 2008
ER -