9 ms carrier lifetime in kerfless epitaxial wafers by n-type POLO gettering

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Autoren

  • Catherin Gemmel
  • Jan Hensen
  • Nils Folchert
  • Felix Haase
  • Robby Peibst
  • Sarah Kajari-Schröder
  • Rolf Brendel

Externe Organisationen

  • Institut für Solarenergieforschung GmbH (ISFH)
Forschungs-netzwerk anzeigen

Details

OriginalspracheEnglisch
Titel des SammelwerksSiliconPV 2018, the 8th International Conference on Crystalline Silicon Photovoltaics
PublikationsstatusVeröffentlicht - 10 Aug. 2018
VeranstaltungSiliconPV 2018: The 8th International Conference on Crystalline Silicon Photovoltaics - Lausanne, Schweiz
Dauer: 19 März 201821 März 2018

Publikationsreihe

NameAIP Conference Proceedings
Band1999
ISSN (Print)0094-243X
ISSN (elektronisch)1551-7616

Abstract

The bulk lifetime of epitaxially grown silicon wafers increases significantly after phosphorous diffusion gettering. A strong diffusion is advantageous for gettering but is not ideal for highest solar cell efficiencies. We find that gettering with an n-type polycrystalline silicon on oxide (POLO) junction increases the bulk lifetime of epitaxial wafers from originally 2.3 to 4.3 ms to finally up to 8 ms at an injection level Δp = 1015 cm-3. This lifetime increase as large as for phosphorous-diffusion gettering. However, POLO junctions have a superior surface passivation when compared to diffused junctions. This offers a novel gettering process that not only increase the charge carrier lifetime of epitaxial wafers but can also be effectively integrated into a solar cell processes employing POLO junctions.

ASJC Scopus Sachgebiete

Zitieren

9 ms carrier lifetime in kerfless epitaxial wafers by n-type POLO gettering. / Gemmel, Catherin; Hensen, Jan; Folchert, Nils et al.
SiliconPV 2018, the 8th International Conference on Crystalline Silicon Photovoltaics. 2018. 130005 (AIP Conference Proceedings; Band 1999).

Publikation: Beitrag in Buch/Bericht/Sammelwerk/KonferenzbandAufsatz in KonferenzbandForschungPeer-Review

Gemmel, C, Hensen, J, Folchert, N, Haase, F, Peibst, R, Kajari-Schröder, S & Brendel, R 2018, 9 ms carrier lifetime in kerfless epitaxial wafers by n-type POLO gettering. in SiliconPV 2018, the 8th International Conference on Crystalline Silicon Photovoltaics., 130005, AIP Conference Proceedings, Bd. 1999, SiliconPV 2018: The 8th International Conference on Crystalline Silicon Photovoltaics, Lausanne, Schweiz, 19 März 2018. https://doi.org/10.1063/1.5049324
Gemmel, C., Hensen, J., Folchert, N., Haase, F., Peibst, R., Kajari-Schröder, S., & Brendel, R. (2018). 9 ms carrier lifetime in kerfless epitaxial wafers by n-type POLO gettering. In SiliconPV 2018, the 8th International Conference on Crystalline Silicon Photovoltaics Artikel 130005 (AIP Conference Proceedings; Band 1999). https://doi.org/10.1063/1.5049324
Gemmel C, Hensen J, Folchert N, Haase F, Peibst R, Kajari-Schröder S et al. 9 ms carrier lifetime in kerfless epitaxial wafers by n-type POLO gettering. in SiliconPV 2018, the 8th International Conference on Crystalline Silicon Photovoltaics. 2018. 130005. (AIP Conference Proceedings). doi: 10.1063/1.5049324
Gemmel, Catherin ; Hensen, Jan ; Folchert, Nils et al. / 9 ms carrier lifetime in kerfless epitaxial wafers by n-type POLO gettering. SiliconPV 2018, the 8th International Conference on Crystalline Silicon Photovoltaics. 2018. (AIP Conference Proceedings).
Download
@inproceedings{f00c78a7b30644cd9ad37b634fb039fa,
title = "9 ms carrier lifetime in kerfless epitaxial wafers by n-type POLO gettering",
abstract = "The bulk lifetime of epitaxially grown silicon wafers increases significantly after phosphorous diffusion gettering. A strong diffusion is advantageous for gettering but is not ideal for highest solar cell efficiencies. We find that gettering with an n-type polycrystalline silicon on oxide (POLO) junction increases the bulk lifetime of epitaxial wafers from originally 2.3 to 4.3 ms to finally up to 8 ms at an injection level Δp = 1015 cm-3. This lifetime increase as large as for phosphorous-diffusion gettering. However, POLO junctions have a superior surface passivation when compared to diffused junctions. This offers a novel gettering process that not only increase the charge carrier lifetime of epitaxial wafers but can also be effectively integrated into a solar cell processes employing POLO junctions.",
author = "Catherin Gemmel and Jan Hensen and Nils Folchert and Felix Haase and Robby Peibst and Sarah Kajari-Schr{\"o}der and Rolf Brendel",
note = "Funding Information: The authors would like to thank Jessica Strey for wafer processing. This work was funded by the German Federal Ministry for Economic Affairs and Energy under Grant 0324107 (NEPSIC) and the state of Lower Saxony. Publisher Copyright: {\textcopyright} 2018 Author(s). Copyright: Copyright 2018 Elsevier B.V., All rights reserved.; SiliconPV 2018: The 8th International Conference on Crystalline Silicon Photovoltaics ; Conference date: 19-03-2018 Through 21-03-2018",
year = "2018",
month = aug,
day = "10",
doi = "10.1063/1.5049324",
language = "English",
isbn = "9780735417151",
series = "AIP Conference Proceedings",
booktitle = "SiliconPV 2018, the 8th International Conference on Crystalline Silicon Photovoltaics",

}

Download

TY - GEN

T1 - 9 ms carrier lifetime in kerfless epitaxial wafers by n-type POLO gettering

AU - Gemmel, Catherin

AU - Hensen, Jan

AU - Folchert, Nils

AU - Haase, Felix

AU - Peibst, Robby

AU - Kajari-Schröder, Sarah

AU - Brendel, Rolf

N1 - Funding Information: The authors would like to thank Jessica Strey for wafer processing. This work was funded by the German Federal Ministry for Economic Affairs and Energy under Grant 0324107 (NEPSIC) and the state of Lower Saxony. Publisher Copyright: © 2018 Author(s). Copyright: Copyright 2018 Elsevier B.V., All rights reserved.

PY - 2018/8/10

Y1 - 2018/8/10

N2 - The bulk lifetime of epitaxially grown silicon wafers increases significantly after phosphorous diffusion gettering. A strong diffusion is advantageous for gettering but is not ideal for highest solar cell efficiencies. We find that gettering with an n-type polycrystalline silicon on oxide (POLO) junction increases the bulk lifetime of epitaxial wafers from originally 2.3 to 4.3 ms to finally up to 8 ms at an injection level Δp = 1015 cm-3. This lifetime increase as large as for phosphorous-diffusion gettering. However, POLO junctions have a superior surface passivation when compared to diffused junctions. This offers a novel gettering process that not only increase the charge carrier lifetime of epitaxial wafers but can also be effectively integrated into a solar cell processes employing POLO junctions.

AB - The bulk lifetime of epitaxially grown silicon wafers increases significantly after phosphorous diffusion gettering. A strong diffusion is advantageous for gettering but is not ideal for highest solar cell efficiencies. We find that gettering with an n-type polycrystalline silicon on oxide (POLO) junction increases the bulk lifetime of epitaxial wafers from originally 2.3 to 4.3 ms to finally up to 8 ms at an injection level Δp = 1015 cm-3. This lifetime increase as large as for phosphorous-diffusion gettering. However, POLO junctions have a superior surface passivation when compared to diffused junctions. This offers a novel gettering process that not only increase the charge carrier lifetime of epitaxial wafers but can also be effectively integrated into a solar cell processes employing POLO junctions.

UR - http://www.scopus.com/inward/record.url?scp=85051926472&partnerID=8YFLogxK

U2 - 10.1063/1.5049324

DO - 10.1063/1.5049324

M3 - Conference contribution

AN - SCOPUS:85051926472

SN - 9780735417151

T3 - AIP Conference Proceedings

BT - SiliconPV 2018, the 8th International Conference on Crystalline Silicon Photovoltaics

T2 - SiliconPV 2018: The 8th International Conference on Crystalline Silicon Photovoltaics

Y2 - 19 March 2018 through 21 March 2018

ER -