Details
| Originalsprache | Englisch |
|---|---|
| Titel des Sammelwerks | Scanning Microscopies 2011 |
| Untertitel | Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences |
| Seitenumfang | 15 |
| Publikationsstatus | Veröffentlicht - 1 Juni 2011 |
| Veranstaltung | Scanning Microscopies 2011: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences - Orlando, FL, USA / Vereinigte Staaten Dauer: 26 Apr. 2011 → 28 Apr. 2011 |
Publikationsreihe
| Name | Proceedings of SPIE - The International Society for Optical Engineering |
|---|---|
| Band | 8036 |
| ISSN (Print) | 0277-786X |
Abstract
Due to the emerging degree of miniaturization in microstructures, Scanning-Electron-Microscopes (SEM) have become important instruments in the quality assurance of chip manufacturing. With a two- or multiple detector system for secondary electrons, a SEM can be used for the reconstruction of three dimensional surface profiles. Although there are several projects dealing with the reconstruction of three dimensional surfaces using electron microscopes with multiple Everhart-Thornley detectors (ETD), there is no profound knowledge of the behaviour of emitted electrons. Hence, several values, which are used for reconstruction algorithms, such as the photometric method, are only estimates; for instance, the exact collection efficiency of the ETD, which is still unknown. This paper deals with the simulation of electron trajectories in a one-, two- and four-detector system with varying working distances and varying grid currents. For each detector, the collection efficiency is determined by taking the working distance and grid current into account. Based on the gathered information, a new collection grid, which provides a homogenous emission signal for each detector of a multiple detector system, is developed. Finally, the results of the preceding tests are utilized for a reconstruction of a three dimensional surface using the photometric method with a non-lambert intensity distribution.
ASJC Scopus Sachgebiete
- Werkstoffwissenschaften (insg.)
- Elektronische, optische und magnetische Materialien
- Physik und Astronomie (insg.)
- Physik der kondensierten Materie
- Informatik (insg.)
- Angewandte Informatik
- Mathematik (insg.)
- Angewandte Mathematik
- Ingenieurwesen (insg.)
- Elektrotechnik und Elektronik
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- BibTex
- RIS
Scanning Microscopies 2011: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences. 2011. 803615 (Proceedings of SPIE - The International Society for Optical Engineering; Band 8036).
Publikation: Beitrag in Buch/Bericht/Sammelwerk/Konferenzband › Aufsatz in Konferenzband › Forschung › Peer-Review
}
TY - GEN
T1 - 3D-measurement using a Scanning Electron Microscope with 4 Everhart-Thornley Detectors
AU - Vynnyk, Taras
AU - Scheuer, Renke
AU - Reithmeier, Eduard
PY - 2011/6/1
Y1 - 2011/6/1
N2 - Due to the emerging degree of miniaturization in microstructures, Scanning-Electron-Microscopes (SEM) have become important instruments in the quality assurance of chip manufacturing. With a two- or multiple detector system for secondary electrons, a SEM can be used for the reconstruction of three dimensional surface profiles. Although there are several projects dealing with the reconstruction of three dimensional surfaces using electron microscopes with multiple Everhart-Thornley detectors (ETD), there is no profound knowledge of the behaviour of emitted electrons. Hence, several values, which are used for reconstruction algorithms, such as the photometric method, are only estimates; for instance, the exact collection efficiency of the ETD, which is still unknown. This paper deals with the simulation of electron trajectories in a one-, two- and four-detector system with varying working distances and varying grid currents. For each detector, the collection efficiency is determined by taking the working distance and grid current into account. Based on the gathered information, a new collection grid, which provides a homogenous emission signal for each detector of a multiple detector system, is developed. Finally, the results of the preceding tests are utilized for a reconstruction of a three dimensional surface using the photometric method with a non-lambert intensity distribution.
AB - Due to the emerging degree of miniaturization in microstructures, Scanning-Electron-Microscopes (SEM) have become important instruments in the quality assurance of chip manufacturing. With a two- or multiple detector system for secondary electrons, a SEM can be used for the reconstruction of three dimensional surface profiles. Although there are several projects dealing with the reconstruction of three dimensional surfaces using electron microscopes with multiple Everhart-Thornley detectors (ETD), there is no profound knowledge of the behaviour of emitted electrons. Hence, several values, which are used for reconstruction algorithms, such as the photometric method, are only estimates; for instance, the exact collection efficiency of the ETD, which is still unknown. This paper deals with the simulation of electron trajectories in a one-, two- and four-detector system with varying working distances and varying grid currents. For each detector, the collection efficiency is determined by taking the working distance and grid current into account. Based on the gathered information, a new collection grid, which provides a homogenous emission signal for each detector of a multiple detector system, is developed. Finally, the results of the preceding tests are utilized for a reconstruction of a three dimensional surface using the photometric method with a non-lambert intensity distribution.
UR - http://www.scopus.com/inward/record.url?scp=79960401667&partnerID=8YFLogxK
U2 - 10.1117/12.883884
DO - 10.1117/12.883884
M3 - Conference contribution
AN - SCOPUS:79960401667
SN - 9780819486103
T3 - Proceedings of SPIE - The International Society for Optical Engineering
BT - Scanning Microscopies 2011
T2 - Scanning Microscopies 2011: Advanced Microscopy Technologies for Defense, Homeland Security, Forensic, Life, Environmental, and Industrial Sciences
Y2 - 26 April 2011 through 28 April 2011
ER -