19%-efficient and 43 μm-thick crystalline Si solar cell from layer transfer using porous silicon

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Autoren

  • Jan Hendrik Petermann
  • Dimitri Zielke
  • Jan Schmidt
  • Felix Haase
  • Enrique Garralaga Rojas
  • Rolf Brendel

Organisationseinheiten

Externe Organisationen

  • Institut für Solarenergieforschung GmbH (ISFH)
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Details

OriginalspracheEnglisch
Seiten (von - bis)1-5
Seitenumfang5
FachzeitschriftProgress in Photovoltaics: Research and Applications
Jahrgang20
Ausgabenummer1
Frühes Online-Datum29 Dez. 2011
PublikationsstatusElektronisch veröffentlicht (E-Pub) - 29 Dez. 2011

Abstract

We present a both-sides-contacted thin-film crystalline silicon (c-Si) solar cell with a confirmed AM1.5 efficiency of 19.1% using the porous silicon layer transfer process. The aperture area of the cell is 3.98 cm 2. This is the highest efficiency ever reported for transferred Si cells. The efficiency improvement over the prior state of the art (16.9%) is achieved by implementing recent developments for Si wafer cells such as surface passivation with aluminum oxide and laser ablation for contacting. The cell has a short-circuit current density of 37.8 mA cm -2, an open-circuit voltage of 650 mV, and a fill factor of 77.6%.

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Zitieren

19%-efficient and 43 μm-thick crystalline Si solar cell from layer transfer using porous silicon. / Petermann, Jan Hendrik; Zielke, Dimitri; Schmidt, Jan et al.
in: Progress in Photovoltaics: Research and Applications, Jahrgang 20, Nr. 1, 29.12.2011, S. 1-5.

Publikation: Beitrag in FachzeitschriftArtikelForschungPeer-Review

Petermann JH, Zielke D, Schmidt J, Haase F, Rojas EG, Brendel R. 19%-efficient and 43 μm-thick crystalline Si solar cell from layer transfer using porous silicon. Progress in Photovoltaics: Research and Applications. 2011 Dez 29;20(1):1-5. Epub 2011 Dez 29. doi: 10.1002/pip.1129
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